Journal article
ZnO nanostructures induced by microwave plasma


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Publication Details
Author list: Elsayed KA, Anad NS, AbdelFattah G, Imam H, Kayed TS, Ismail LZ
Publisher: Elsevier
Publication year: 2015
Journal: Arabian Journal of Chemistry
Journal name in source: ARABIAN JOURNAL OF CHEMISTRY
Volume number: 8
Issue number: 4
Start page: 553
End page: 559
Number of pages: 7
ISSN: 1878-5352
Web of Science ID: 000355938600017
PubMed ID:
Scopus ID: 84937632342


Microwave induced hydrogen plasma is used to fabricate ZnO thin films at low ambient gas pressure and controlled oxygen content in the gas mixture. The emission spectra have been observed. Optical emission spectroscopy was used to identify the chemical reaction mechanism. Structural quality of the so-obtained nanoparticles was studied by X-ray diffraction (XRD) and high resolution scanning electron microscopy (SEM). SEM results showed that nanorods were formed in the process, and XRD results along with nanorod dimensions obtained from SEM are consistent with the formation of single and poly-crystalline ZnO nanorods. The alignment of these nanorods with respect to the substrates depends on the lattice mismatch between ZnO and the glass substrate. The minimum crystallite grain size as obtained from the SEM measurements was similar to 24 nm and the average diameter is 70 nm with a length of 1-2 mu m. The deposited ZnO thin films have a wide energy band gap that equals similar to 3 eV. (C) 2014 The Authors. Production and hosting by Elsevier B.V. on behalf of King Saud University.

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Keywords
Band gap, Nanorods, ZnO nanostructure

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Last updated on 2018-06-02 at 16:36